| 청구기호 |
QD96.S43 F435 2015eb |
| 형태사항 |
1 online resource (various pagings) : illustrations (some color).
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| 총서명 |
IOP concise physics, 2053-2571
[IOP release 2]
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| 언어 |
English |
| 일반주기 |
"Version: 20151001"--Title page verso.
"A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso.
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| 서지주기 |
Includes bibliographical references.
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| 내용 |
Preface -- Author biography -- 1. Introduction -- 1.1. Overview -- 1.2. Basic principles
2. Practical requirements -- 2.1. Ion generation -- 2.2. Primary and sputter ion beam sources -- 2.3. Mass analysis -- 2.4. Ion detection -- 2.5. Ultra high vacuum
3. Modes of analysis -- 3.1. High-resolution mass spectra -- 3.2. Depth profiling
4. Ion beam-target interactions -- 4.1. Ion beam induced atomic mixing -- 4.2. Beam induced surface roughening and uneven etching -- 4.3. Beam induced segregation -- 4.4. Other beam induced effects -- 4.5. Depth profiling with cluster ion beams
5. Application to materials science -- 5.1. Biomaterials and tissue studies -- 5.2. Glass corrosion -- 5.3. Ceramic oxides -- 5.4. Semiconductor analysis -- 5.5. Organic electronics -- 6. Summary.
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| 주제 |
Secondary ion mass spectrometry.
Time-of-flight mass spectrometry.
Materials science.
Microscopy. --bicssc
TECHNOLOGY & ENGINEERING / Measurement. --bisacsh
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| 보유판 및 특별호 저록 |
Print version: 9781681740249
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| ISBN |
9781681740881, 9781681742168, 9781681740249 |
| 기타 표준번호 |
10.1088/978-1-6817-4088-1 |
| QR CODE |
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